Fabrication of nanopores in a 100-nm thick Si 3N 4 membrane

Jae Hyun Chung, Xinqi Chen, Eric J. Zimney, Rodney S. Ruoff*

*Corresponding author for this work

Research output: Contribution to journalArticle

8 Scopus citations

Abstract

Textured alumina films have been used to fabricate nanoscale pores in Si 3N 4 membranes. A few nanometer-thick alumina layer was used as a masking material for nanopore fabrication, and the pattern was transferred into a 100-nm thick, 200 μm × 200 μm Si 3N 4 membrane by reactive ion etching (RIE). The nanopores were found to be concentrated in a ∼150-μm diameter region at the center of the membrane.

Original languageEnglish (US)
Pages (from-to)2175-2181
Number of pages7
JournalJournal of Nanoscience and Nanotechnology
Volume6
Issue number7
DOIs
StatePublished - Jul 1 2006

Keywords

  • Alumina Film
  • Nanopores
  • Reactive Ion Etching
  • Si N membrane

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Materials Science (miscellaneous)
  • Engineering (miscellaneous)

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