Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography

Hua Zhang, Sung Wook Chung, Chad A. Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

169 Scopus citations

Abstract

The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12-100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold.

Original languageEnglish (US)
Pages (from-to)43-45
Number of pages3
JournalNano letters
Volume3
Issue number1
DOIs
StatePublished - Jan 1 2003

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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