Far-field optical superlens

Zhaowei Liu, Stéphane Durant, Hyesog Lee, Yuri Pikus, Nicolas Fang, Yi Xiong, Cheng Sun, Xiang Zhang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

326 Scopus citations


Far-field optical lens resolution is fundamentally limited by diffraction, which typically is about half of the wavelength. This is due to the evanescent waves carrying small scale information from an object that fades away in the far field. A recently proposed superlens theory offers a new approach by surface excitation at the negative index medium. We introduce a far-field optical superlens (FSL) that is capable of imaging beyond the diffraction limit. The FSL significantly enhances the evanescent waves of an object and converts them into propagating waves that are measured in the far field. We show that a FSL can image a subwavelength object consisting of two 50 nm wide lines separated by 70 nm working at 377 nm wavelength. The optical FSL promises new potential for nanoscale imaging and lithography.

Original languageEnglish (US)
Pages (from-to)403-408
Number of pages6
JournalNano letters
Issue number2
StatePublished - Feb 1 2007

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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