Ferroelectric epitaxial thin films for integrated optics

Bruce W. Wessels*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapter

128 Scopus citations

Abstract

Thin film ferroelectrics are being developed for integrated optics applications. Their major advantage lies in their large electro-optic coefficients. Furthermore, they are nearly transparent from the mid-infrared to the visible spectral region. With the development of epitaxial deposition techniques for ferroelectrics, waveguide structures with low optical loss have been demonstrated. Through the use of epitaxial thin films deposited on low-index substrates, high-bandwidth electro-optic modulators have also been attained.

Original languageEnglish (US)
Title of host publicationAnnual Review of Materials Research
EditorsDavid Clarke, Manfred Ruehle, Venkatraman Gopalan
Pages659-679
Number of pages21
DOIs
StatePublished - 2007

Publication series

NameAnnual Review of Materials Research
Volume37
ISSN (Print)1531-7331

Keywords

  • Barium titanate
  • Electro-optic
  • Modulator
  • Optical switching
  • Photonic crystal
  • Waveguide

ASJC Scopus subject areas

  • Materials Science(all)

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