Ferromagnetic thin films for loss reduction in on-chip transmission lines

Pedram Khalili Amiri*, Behzad Rejaei, Yan Zhuang, Marina Vroubel, Joachim N. Burghartz

*Corresponding author for this work

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

Microstrip transmission lines fabricated on standard silicon wafers are shown to benefit from the incorporation of thin ferromagnetic Ni-Fe films when compared to control devices without Ni-Fe. At 1 GHz, inductance and quality factor of the microstrip lines are enhanced by factors of 6 and 3, respectively, while the characteristic impedance of a 20 μm wide line is increased by 85%. For constant characteristic impedance, a 200 nm thick Ni-Fe film reduces attenuation from 1.6 to 0.7 dB/cm at 500 MHz.

Original languageEnglish (US)
Pages (from-to)2630-2632
Number of pages3
JournalIEEE Transactions on Magnetics
Volume43
Issue number6
DOIs
StatePublished - Jun 1 2007

Keywords

  • Integrated circuit interconnections
  • Magnetic microwave devices
  • Microstrip
  • Planar transmission lines

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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