Field-ion specimen preparation using focused ion-beam milling

D. J. Larson*, D. T. Foord, A. K. Petford-Long, H. Liew, M. G. Blamire, A. Cerezo, G. D W Smith

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

224 Scopus citations


Preparation of field-ion specimens from various materials has been accomplished using focused ion-beam milling in either a simple cutting mode or by application of an annular-shaped ion-milling pattern. These specimens have been investigated using field-ion microscopy and three-dimensional atom probe analysis. In the cutting mode, gallium implantation is minimised when using a lower beam energy. However, with annular milling, using 30keV ions opposed to 10keV ions results in less gallium implantation and produces a smaller shank angle and a sharper apex radius. High-dose ion imaging at 30keV ion energy, even with relatively low beam currents, results in excessive implantation during field-ion specimen fabrication. Focused ion-beam milling provides not only an alternative method of field-ion sample preparation, but also, in conjunction with atom probe analysis, allows the quantitative investigation of the gallium implantation and damage which occurs during the milling. Copyright (C) 1999 Elsevier Science B.V.

Original languageEnglish (US)
Pages (from-to)287-293
Number of pages7
Issue number1-4
StatePublished - Sep 1999


  • Ion-beam milling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation


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