First-principles predictions and in situ experimental validation of alumina atomic layer deposition on metal surfaces

Keyphrases

• Experimental Validation 100%
• In Situ 100%
• Atomic Layer Deposition 100%
• Metal Surface 100%
• Aluminum Oxide 100%
• First-principle Prediction 100%
• Trimethylaluminum 60%
• Density Functional Calculations 40%
• Scanning Tunneling Microscopy 40%
• Quartz Crystal Microbalance with Dissipation (QCM-D) 40%
• Metal Sites 40%
• Low Coordination 40%
• Quadrupole Mass Spectroscopy 40%
• Free Energy 20%
• Corrosion Resistance 20%
• Microelectronics 20%
• Dissociation 20%
• Metal Deposition 20%
• Metal Oxide 20%
• Water Exposure 20%
• Enhanced Selectivity 20%
• Metal Oxide Catalyst 20%
• High-temperature Treatment 20%
• Pt Surface 20%
• Surface Species 20%
• Dissociative Adsorption 20%
• Cu Surface 20%
• PdPt 20%
• Asterisk 20%
• Endothermicity 20%
• PdCu 20%
• PtCu 20%
• (111) Facet 20%
• Metal-metal Oxide 20%
• Pd Surface 20%
• Aluminum Hydroxide 20%
• After High Temperature 20%
• Pt-Ir 20%

Chemistry

• Atomic Layer Epitaxy 100%
• First Principle 100%
• Aluminum Oxide 100%
• Scanning Tunneling Microscopy 40%
• Quadrupole Mass Spectroscopy 40%
• Metal Oxide 40%
• Density Functional Theory 40%
• Dissociative Chemisorption 20%
• Free Energy 20%
• Corrosion Resistance 20%
• Aluminum 20%
• Microelectronics 20%
• Sintering 20%

Material Science

• Al2O3 100%
• Metal Surface 100%
• Aluminum Oxide 100%
• Metal Oxide 50%
• Catalysis 50%
• Density 50%
• Chemisorption 25%
• Corrosion Resistance 25%
• Surface (Surface Science) 25%
• Aluminum 25%
• Sintering 25%