Abstract
We report in this letter the first successful fabrication of an InP-GaInAsP light-emitting diode, emitting at 1.15 μm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 mA), and showed no degradation.
Original language | English (US) |
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Pages (from-to) | 854-855 |
Number of pages | 2 |
Journal | Applied Physics Letters |
Volume | 53 |
Issue number | 10 |
DOIs | |
State | Published - 1988 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)