Flexible IGZO TFTs with a disruptive photo-patternable and thermally stable organic gate insulator

Hsing Hung Hsieh, Shiuan Iou Lin, William C. Sheets, Su Jin Kang, Cheng Wei Chou, Wan Yu Hung, Yu Xia, Scott Bull, Antonio Facchetti, Chung Chin Hsiao

Research output: Contribution to journalConference articlepeer-review

8 Scopus citations

Abstract

A new photo-patternable and thermally-stable organic gate insulator has been developed specifically for IGZO TFTs. Combined with an optimized device platform, flexible IGZO TFTs show groundbreaking performance such as high field-effect mobilities, negligible I-V hysteresis, excellent optical transparency and good thermal and bias-temperature stress stability. A 5′ flexible AMOLED utilizes these technologies has been fabricated.

Original languageEnglish (US)
Pages (from-to)486-489
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Volume46
Issue numberBook 1
DOIs
StatePublished - Jun 1 2015
Event2015 SID International Symposium - San Jose, United States
Duration: Jun 2 2015Jun 3 2015

Keywords

  • AMOLED
  • Amorphous IGZO
  • Dielectric
  • Flexible display
  • Metal oxide TFT
  • Organic gate insulator
  • Photo-patternable

ASJC Scopus subject areas

  • General Engineering

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