Flying plasmonic lens at near field for high speed nano-lithography

Liang Pan*, Yong Shik Park, Yi Xiong, Erick Ulin-Avila, Li Zeng, Cheng Sun, David B. Bogy, Xiang Zhang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations


Optical lithography has been the key for continuous size reduction of semiconductor devices and circuits manufacturing. Although the industry is continually improving the resolution, optical lithography becomes more difficult and less cost effective in satisfying the ever increasing demands in nano-manufacturing. Besides manufacturing, the dramatic advancements in nanoscale science and engineering also call an urgent need for high-throughput nano-fabrication technologies that are versatile to frequent design changes. Here we experimentally demonstrated the capability of patterning with 50 nm linewidth with a high flying speed at 10 meter/second. This low-cost nano-fabrication scheme has the potential of a few orders of magnitude higher throughput than current maskless techniques, and promises a new route towards the next generation nano-manufacturing. Besides its application in nanolithography, this technique can also be used for nanoscale metrology, imaging and data storage.

Original languageEnglish (US)
Title of host publicationAlternative Lithographic Technologies II
StatePublished - Jun 15 2010
EventAlternative Lithographic Technologies II - San Jose, CA, United States
Duration: Feb 23 2010Feb 25 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherAlternative Lithographic Technologies II
CountryUnited States
CitySan Jose, CA

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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