Focused ion-beam specimen preparation for atom probe field-ion microscopy characterization of multilayer film structures

D. J. Larson*, D. T. Foord, A. K. Petford-Long, A. Cerezo, G. D W Smith

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

37 Scopus citations

Abstract

Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate field-ion specimens from a multilayer film nanostructure containing 100 repetitions of a (Cu2 nm/Co2 nm) bilayer deposited directly onto a planar substrate. Successful field-ion specimen preparation has allowed the observation of these layers on the atomic scale by both field-ion imaging and atom probe compositional analysis.

Original languageEnglish (US)
Pages (from-to)45-50
Number of pages6
JournalNanotechnology
Volume10
Issue number1
DOIs
StatePublished - Mar 1 1999

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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