"force-feedback" leveling of massively parallel arrays in polymer pen lithography

Xing Liao, Adam B. Braunschweig, Chad A. Mirkin

Research output: Contribution to journalArticlepeer-review

40 Scopus citations


Polymer pen lithography is a recently developed molecular printing technique which can produce features with diameters ranging from 80 nm to >10 μm in a single writing step using massively parallel (>107 pens) arrays of pyramidal, elastomeric pens. Leveling these pen arrays with respect to the surface to produce uniform features over large areas remains a considerable challenge. Here, we describe a new method for leveling the pen arrays that utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004°, thereby producing features that vary by only 50 nm over 1 cm.

Original languageEnglish (US)
Pages (from-to)1335-1340
Number of pages6
JournalNano letters
Issue number4
StatePublished - Apr 14 2010


  • AFM
  • Dip pen nanolithography
  • Scanning probe lithography

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanical Engineering
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)


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