Formation of high aspect ratio GaAs nanostructures with metal-assisted chemical etching

Keyphrases

• High Aspect Ratio 100%
• Metal-assisted Chemical Etching 100%
• GaAs Nanostructures 100%
• Device Structure 33%
• Gallium Arsenide 33%
• Wet Etching 33%
• Sidewall 33%
• GaAs Substrate 33%
• GaAs Nanowires 33%
• Au Catalyst 33%
• Nanopillars 33%
• Distributed Bragg Reflector 33%
• Dry Etching 33%
• Nanostructured Arrays 33%
• Soft Lithography 33%
• Etching Rate 33%
• Surface Grating 33%
• Distributed Feedback (DFB) Laser 33%
• Etching Temperature 33%
• Photocatalyst Film 33%
• III-V Nanostructures 33%
• Etchant Concentration 33%

Material Science

• Nanostructure 100%
• Gallium Arsenide 100%
• Wet Etching 25%
• Nanowires 25%
• Lithography 25%
• Dry Etching 25%
• Film 25%
• Surface (Surface Science) 25%
• Semiconductor Laser 25%