Physics
Wafer
100%
Flat Surfaces
100%
Metalorganic Chemical Vapor Deposition
100%
Homogeneity
100%
Quantum Well Lasers
100%
Laser Outputs
100%
Area
100%
Fabrication
100%
Laser
100%
Coating
100%
Width
100%
Low Pressure
100%
INIS
lasers
100%
quantum wells
100%
gallium arsenides
100%
fabrication
33%
organometallic compounds
33%
power
33%
output
33%
coatings
33%
chemical vapor deposition
33%
quantum efficiency
33%
width
33%
low pressure
33%
threshold current
33%
Engineering
Emitting Laser
100%
Fabrication
50%
Quantum Efficiency
50%
Metal Organic Chemical Vapor Deposition
50%
Current Threshold
50%
Laser Output Power
50%
Coating
50%
Low Pressure
50%
Material Science
Gallium Arsenide
100%
Quantum Well
100%
Laser
100%
Metal-Organic Chemical Vapor Deposition
33%
Coating
33%