Gate length variation effect on performance of gate-first self-aligned In0.53Ga0.47As MOSFET

Mohd F. Mohd Razip Wee, Arash Dehzangi, Sylvain Bollaert, Nicolas Wichmann, Burhanuddin Y. Majlis

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

A multi-gate n-type In0.53Ga0.47As MOSFET is fabricated using gate-first self-aligned method and air-bridge technology. The devices with different gate lengths were fabricated with the Al 2O3 oxide layer with the thickness of 8 nm. In this letter, impact of gate length variation on device parameter such as threshold voltage, high and low voltage transconductance, subthreshold swing and off current are investigated at room temperature. Scaling the gate length revealed good enhancement in all investigated parameters but the negative shift in threshold voltage was observed for shorter gate lengths. The high drain current of 1.13 A/mm and maximum extrinsic transconductance of 678 mS/mm with the field effect mobility of 364 cm2/Vs are achieved for the gate length and width of 0.2 μm and 30μm, respectively. The source/drain overlap length for the device is approximately extracted about 51 nm with the leakage current in order of 10-8 A. The results of RF measurement for cut-off and maximum oscillation frequency for devices with different gate lengths are compared.

Original languageEnglish (US)
Article numbere82731
JournalPloS one
Volume8
Issue number12
DOIs
StatePublished - Dec 18 2013

ASJC Scopus subject areas

  • Biochemistry, Genetics and Molecular Biology(all)
  • Agricultural and Biological Sciences(all)
  • General

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