Generation of arbitrary lithographic patterns and three-dimensional atomic holograms using BEC interferometry

M. F. Fouda, R. Fang, M. S. Monjur, J. B. Ketterson, Selim M Shahriar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We describe two applications for Bose-Einstein Condensate (BEC) based atomic interferometry: generation of arbitrary lithographic patterns and three dimensional atomic holograms, using light shift induced phase masks generated from optical interferometry and digital holography.

Original languageEnglish (US)
Title of host publicationFrontiers in Optics, FIO 2013
PublisherOptical Society of America (OSA)
ISBN (Print)9781557529879
DOIs
StatePublished - 2013
EventFrontiers in Optics, FIO 2013 - Orlando, FL, United States
Duration: Oct 6 2013Oct 10 2013

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherFrontiers in Optics, FIO 2013
CountryUnited States
CityOrlando, FL
Period10/6/1310/10/13

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Fouda, M. F., Fang, R., Monjur, M. S., Ketterson, J. B., & Shahriar, S. M. (2013). Generation of arbitrary lithographic patterns and three-dimensional atomic holograms using BEC interferometry. In Frontiers in Optics, FIO 2013 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/fio.2013.fth3f.3