Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
|Original language||English (US)|
|Number of pages||4|
|State||Published - Sep 3 2002|
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering