Generation of metal photomasks by dip-pen nanolithography

Jae Won Jang, Raymond G. Sanedrin, Andrew J. Senesi, Zijian Zheng, Xiaodong Chen, Seongpil Hwang, Ling Huang, Chad A. Mirkin

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Abstract

The challenge of using DPN (dip-pen nanolithography) and associated chemistry to make photomasks of chromium on quartz and evaluate their utility as masters to prepare microelectrode arrays by conventional photolithography, was investigated. 1D pen arrays were coated with ODT by thermal evaporation and PEG by tip dipping in 5mg ml 1 PEG acetonitrile solution for 30s. All DPN-patterning experiments were carried out undercontrolled humidity and temperature. The Au films were etched for 10 mm with aqueous etching solution containing 20mm thiourea, 30mm iron nitrate, 20mm hydrochloric acid, and 2mm 1 octanol. All photolithography experiments were carried out with a mask aligner and positive-type photoresist. It was concluded that the numbers of photomasks can be increased through the use of arrays with larger number of pens, or through the use of contact printing-PN hybrid technique known as polymer-pen lithography.

Original languageEnglish (US)
Pages (from-to)1850-1853
Number of pages4
JournalSmall
Volume5
Issue number16
DOIs
StatePublished - Aug 17 2009

Keywords

  • Dip-pen nanolithography
  • Electrodes
  • Lithography

ASJC Scopus subject areas

  • Biotechnology
  • Biomaterials
  • Chemistry(all)
  • Materials Science(all)

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