Abstract
MgO thin films have been grown on Si(100) substrates at low temperatures of 500-850°C by metal-organic molecular beam epitaxy (MOMBE) using the solid precursor magnesium acetylacetonate. Oxygen plasma is required to achieve deposition. The composition of the films was determined by Auger electron spectroscopy (AES). The as-deposited films are phase-pure, stoichiometric, crystalline MgO with a [100] texture. Carbon contamination of the film resulting from precursor decomposition was not observed within detection limits. The deposition rate depended superlinearly on the plasma source power.
Original language | English (US) |
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Pages (from-to) | 74-77 |
Number of pages | 4 |
Journal | Applied Surface Science |
Volume | 161 |
Issue number | 1 |
DOIs | |
State | Published - Jul 1 2000 |
Funding
The authors are grateful to Dr. Antonio DiVenere for his expert assistance with the MOMBE experiment and for sharing his valuable experience with us. This work was supported by DARPA through the MURI program at Northwestern University monitored by the AFOSR under grant F49620-96-1-0262 and by BMDO through the DURIP program under F49620-96-1-0460.
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Surfaces and Interfaces