TY - JOUR
T1 - Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering
T2 - The role of low-energy ion irradiation during deposition
AU - Hultman, L.
AU - Barnett, S. A.
AU - Sundgren, J. E.
AU - Greene, J. E.
N1 - Funding Information:
The authors gratefully acknowledge the Swedish Board for Technical Development (STUF) and the National Science Research Council (Linkoping University) and the Materials Science Division of the US Department of Energy under the contract number DE-ACO2-76ER01198 (University of Illinois) for financial support during the course of this work. We also appreciate the assistance of Dr. I. Petrov, Dr. G. Radnoczi, L. Markert, and Dr. D. Hesse during plasma probe measurements, de-feet characterization, EDX analysis, and spinel characterization, respectively.
PY - 1988/10/2
Y1 - 1988/10/2
N2 - Plan-view and cross-sectional transmission electron microscopy have been used to investigate the role of low-energy ion irradiation in controlling the defect structure of epitaxial TiN(100). The films were deposited by reactive magnetron sputter deposition onto MgO(100) substrates at film growth temperatures Ts between 550 and 850°C (0.26 to 0.35 of the melting point of TiN in K) and negative substrate biases Vs between 0 and 500 V. Sputtering was carried out in pure N2 atmospheres, the energy per N ion incident at the film surface was ∼ eVs 2 (N2+ was the predominant ionic species), the incident ion to thermal-atom flux ratio for films grown with Vs≥100 V was ∼1.3, and the deposition rate was ∼1 monolayer s-1 (1.3 μm h-1). The primary defects observed in the films were dislocation loops on {111} planes. The number density nd of these loops decreased with increasing Ts (e.g., for Vs=0, nd ranged from 5×1012cm-2 at 550°C to 1.5×1010cm-2 at 850°C). However, nd also decreased rapidly with increasing Vs at constant Ts until a minimum defect density was attained at Vs*(Ts) after which nd incre ased again. Films grown at Ts≥750°C and Vs=Vs* ≅ 300 V were essentially free of dislocation loops. On the other hand, films grown with T s<650°C and Vs≥400V (i.e., Vs > Vs*) exhibited very high dislocation loop densities, ≥5×1012cm-2, together with the preci itation of N2 gas bubbles. The net effect of ion irradiation on film microstructure depended upon a competition between the defect annihilation rate due to enhanced adatom mobilities during deposition and the collisionally-induced defect formation rate. The residual defect density was thus a function of both Ts and Vs. Under the proper growth conditions, ion irradiation led to a reduction in dislocation loop densities by more than 5 orders of magnitude. Cross-sectional micrographs of multilayer films grown as a function of Vs at constant Ts showed that nd increased or decreased (depending upon the direction of the change in Vs) abruptly and reversibly.
AB - Plan-view and cross-sectional transmission electron microscopy have been used to investigate the role of low-energy ion irradiation in controlling the defect structure of epitaxial TiN(100). The films were deposited by reactive magnetron sputter deposition onto MgO(100) substrates at film growth temperatures Ts between 550 and 850°C (0.26 to 0.35 of the melting point of TiN in K) and negative substrate biases Vs between 0 and 500 V. Sputtering was carried out in pure N2 atmospheres, the energy per N ion incident at the film surface was ∼ eVs 2 (N2+ was the predominant ionic species), the incident ion to thermal-atom flux ratio for films grown with Vs≥100 V was ∼1.3, and the deposition rate was ∼1 monolayer s-1 (1.3 μm h-1). The primary defects observed in the films were dislocation loops on {111} planes. The number density nd of these loops decreased with increasing Ts (e.g., for Vs=0, nd ranged from 5×1012cm-2 at 550°C to 1.5×1010cm-2 at 850°C). However, nd also decreased rapidly with increasing Vs at constant Ts until a minimum defect density was attained at Vs*(Ts) after which nd incre ased again. Films grown at Ts≥750°C and Vs=Vs* ≅ 300 V were essentially free of dislocation loops. On the other hand, films grown with T s<650°C and Vs≥400V (i.e., Vs > Vs*) exhibited very high dislocation loop densities, ≥5×1012cm-2, together with the preci itation of N2 gas bubbles. The net effect of ion irradiation on film microstructure depended upon a competition between the defect annihilation rate due to enhanced adatom mobilities during deposition and the collisionally-induced defect formation rate. The residual defect density was thus a function of both Ts and Vs. Under the proper growth conditions, ion irradiation led to a reduction in dislocation loop densities by more than 5 orders of magnitude. Cross-sectional micrographs of multilayer films grown as a function of Vs at constant Ts showed that nd increased or decreased (depending upon the direction of the change in Vs) abruptly and reversibly.
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U2 - 10.1016/0022-0248(88)90048-6
DO - 10.1016/0022-0248(88)90048-6
M3 - Article
AN - SCOPUS:0024091026
SN - 0022-0248
VL - 92
SP - 639
EP - 656
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 3-4
ER -