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Growth responses of ultrathin CN
x
overcoats to process parameters
D. J. Li
*
,
Yip Wah Chung
*
Corresponding author for this work
Materials Science and Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
5
Scopus citations
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x
overcoats to process parameters'. Together they form a unique fingerprint.
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Keyphrases
Ultrathin
100%
X-ray Reflectivity
100%
Overcoat
100%
Growth Response
100%
CNx Film
100%
Reflectivity Measurement
100%
Performance Improvement
50%
Process Parameters Influence
50%
Mass Density
50%
Film Thickness
50%
Film Growth
50%
Without Substrate
50%
Substrate Bias
50%
Momentum Transfer
50%
Ultra-smooth
50%
DC Magnetron Sputtering
50%
Tilt Angle
50%
Sampling Area
50%
Ion Beam Analysis
50%
Corrosion Damage
50%
Material Science
Reflectivity
100%
Film
100%
Magnetron Sputtering
50%
Film Thickness
50%
Surface (Surface Science)
50%
Density
50%
Film Growth
50%
Corrosion
50%
Engineering
Process Parameter
100%
Reflectance
100%
Substrate Bias
50%
Corrosion Damage
50%
Magnetron
50%
Momentum Transfer
50%
Physics
Growth Response
100%
Reflectance
100%
Film Thickness
50%
Momentum Transfer
50%
Magnetron Sputtering
50%
Ion Beam
50%