INIS
films
100%
substrates
57%
glass
57%
electrons
42%
phase transformations
42%
lasers
28%
growth
28%
thin films
28%
x-ray diffraction
28%
deposition
28%
temperature range 0273-0400 k
28%
transition temperature
28%
curie temperature
28%
scanning electron microscopy
14%
cost
14%
scattering
14%
devices
14%
values
14%
layers
14%
buffers
14%
islands
14%
grain size
14%
polycrystals
14%
field emission
14%
Chemistry
Liquid Film
100%
Electron Particle
42%
Glass Substrate
42%
Grain Size
42%
Thin Film Growth
42%
Pulsed Laser Deposition
28%
Curie Temperature
28%
Metal Insulator Transition
28%
Ambient Reaction Temperature
28%
TC
28%
Scanning Electron Microscopy
14%
Field Emission
14%
Phase Transition Temperature
14%
Amorphous Material
14%
Procedure
14%
Scattering
14%
Glass
14%
Resistivity
14%
Physics
Room Temperature
28%
Curie Temperature
28%
Pulsed Laser Deposition
28%
Polycrystalline
14%
Thin Films
14%
Scattering
14%
Transition Temperature
14%
Diffraction Pattern
14%
Electrical Resistivity
14%
Field Emission
14%
Atolls
14%
Magnetic Measurement
14%
Growth
14%
Model
14%
Value
14%
Substrates
14%
Knowledge
14%
Glass
14%
Material Science
Liquid Films
100%
X-Ray Diffraction
85%
Thin Films
14%
Buffer Layer
14%
Glass
14%
Magnetic Device
14%
Amorphous Material
14%