TY - JOUR
T1 - High-performance, continuous-wave quantum-cascade lasers operating up to 85°C at λ ∼ 8.8 μm
AU - Yu, J. S.
AU - Slivken, S.
AU - Evans, A.
AU - Razeghi, M.
PY - 2008/11
Y1 - 2008/11
N2 - High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ ∼ 8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA/cm2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively.
AB - High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ ∼ 8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA/cm2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively.
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U2 - 10.1007/s00339-008-4783-9
DO - 10.1007/s00339-008-4783-9
M3 - Article
AN - SCOPUS:51649101249
SN - 0947-8396
VL - 93
SP - 405
EP - 408
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 2
ER -