Abstract
A study was conducted to demonstrate the first fabrication of thin-film transistors (TFT), using a solution-processed inorganic semiconductor combined with a solution-processed organic gate dielectric. It was found that the field-effect mobilities demonstrated in the study are as high as 57 cm 2V-1s-1, with large lon/l offratios and a subthreshold slopes as low as 0.26 V dec -1. The study also demonstrated that such performance parameters make these devices suitable for a wide range of applications. It was also demonstrated that TFT results represent a significant step in large-area electronics fabrication, considering the simplicity of the semiconductor and dielectric film deposition methods.
Original language | English (US) |
---|---|
Pages (from-to) | 2319-2324 |
Number of pages | 6 |
Journal | Advanced Materials |
Volume | 20 |
Issue number | 12 |
DOIs | |
State | Published - Jun 18 2008 |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering