High-rate deposition of biaxially textured yttria-stabilized zirconia by dual magnetron oblique sputtering

D. Y. Kaufman*, P. M. DeLuca, T. Tsai, Scott A Barnett

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Biaxially textured yttria-stabilized zirconia thin films were deposited at high rates ( ≈ 3 μm/h) using a two-target reactive magnetron sputtering geometry. The two small-area magnetron targets were mounted at 45° or 56° with respect to, and on opposite sides of, the substrate normal. The films showed strong (001) out-of-plane texture. Azimuthal x-ray diffraction scans confirmed strong in-plane texture with a best (111)-peak full width at half maximum of 23°. The alignment was presumably due to directed impingement of sputtered atoms and/or energetic Ar neutrals reflected from the Zr-Y target surfaces. The film texture was not as strong when only one sputter source was used. Sputtering geometries useful for large-scale deposition of textured films are described.

Original languageEnglish (US)
Pages (from-to)2826-2829
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume17
Issue number5
DOIs
StatePublished - Jan 1 1999

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'High-rate deposition of biaxially textured yttria-stabilized zirconia by dual magnetron oblique sputtering'. Together they form a unique fingerprint.

Cite this