High-resistivity nanogranular Co-Al-O films for high-frequency applications

Pedram Khalili Amiri*, Yan Zhuang, Hugo Schellevis, Behzad Rejaei, Marina Vroubel, Yue Ma, Joachim N. Burghartz

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

This work presents a series of high-resistivity nanogranular Co-Al-O films with maximum resistivity of ∼110 m cm. The films were deposited using pulsed dc reactive sputtering of a Co72 Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s -parameter measurements on microstrip transmission lines with Co-Al-O magnetic cores. The high-frequency magnetic permeability profile was extracted from the microstrip measurements. Reduction of deposition power resulted in resistivity enhancement, as well as reduction of coercivity and permeability. SEM images reveal an average grain size of ∼80 nm for films with the highest resistivity.

Original languageEnglish (US)
Article number09M508
JournalJournal of Applied Physics
Volume101
Issue number9
DOIs
StatePublished - 2007

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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