High Resolution Backside Thermography using a Numerical Aperture Increasing Lens

S. Thorne, S. Ippolito, M. Eraslan, B. Goldberg, M. S. Ünlü, Y. Leblebici

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

As the feature size in integrated circuits (ICs) become smaller, the techniques we use to localize defects must also progress to the level that they can resolve potential errors. Additionally, because most errors cannot be identified by visual inspection alone, it is necessary to develop techniques, such as thermography, with the capability of localizing failures to the specific component or defect at fault. This paper will review the theory and application of an advanced subsurface (through the substrate) analytical technique for IC failure analysis - solid immersion lens thermal emission microscopy.

Original languageEnglish (US)
Title of host publicationISTFA 2003
Subtitle of host publicationConference Proceedings from the 29th International Symposium for Testing and Failure Analysis
PublisherASM International
Pages14-17
Number of pages4
ISBN (Electronic)9781615030866
DOIs
StatePublished - 2003
Externally publishedYes
Event29th International Symposium for Testing and Failure Analysis, ISTFA 2003 - Santa Clara, United States
Duration: Nov 2 2003Nov 6 2003

Publication series

NameConference Proceedings from the International Symposium for Testing and Failure Analysis
Volume2003-November

Conference

Conference29th International Symposium for Testing and Failure Analysis, ISTFA 2003
Country/TerritoryUnited States
CitySanta Clara
Period11/2/0311/6/03

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Safety, Risk, Reliability and Quality

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