Abstract
A high spatial resolution photodetector is designed and realized using a newly developed two-sided nanoscale three-dimensional fabrication technique. Two types of nanophotodetectors with slab and channel structures are fabricated and characterized. By comparison, nanophotodetectors with channel structures show a 10 times lower dark current, higher detection resolution, and signal-to-noise ratio than nanophotodetectors with slab structures. The smallest nanophotodetector fabricated is as small as 100 nm wide. A responsivity of 0.19 A/W at 1310-nm wavelength and 3-V bias for a channelized nanophotodetector is registered, with a photocurrent of 135 nA over a dark current of 1.25 nA. In addition, using a modified near-field scanning optical microscopy-based photocurrent mapping system, we demonstrated a high spatial resolution photodetection of 400 nm using a nanophotodetector with channel structure fabricated.
Original language | English (US) |
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Article number | 5445004 |
Pages (from-to) | 929-931 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 22 |
Issue number | 12 |
DOIs | |
State | Published - 2010 |
Keywords
- High spatial resolution
- Photodetectors
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering