High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications

Chee Wei Lee; Yicheng Lai; Y. Yingyan Huang; Boyang Liu; Seng Tiong Ho

doi:10.1364/fio.2009.fthk3

High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications

Chee Wei Lee^*, Yicheng Lai, Y. Yingyan Huang, Boyang Liu, Seng Tiong Ho

^*Corresponding author for this work

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

We present technique of achieving high spatial resolution quantum well intermixing in InP/InGaAsP-based quantum well structures. It utilizes submicron-width deeply-etched trench as diffusion-stopper during the intermixing. Results indicate <0.4 μm spatial control with >100 nm bandgap blueshift.

Original language	English (US)
Title of host publication	Frontiers in Optics, FiO 2009
Publisher	Optical Society of America (OSA)
ISBN (Print)	9781557528780
DOIs	https://doi.org/10.1364/fio.2009.fthk3
State	Published - 2009
Event	Frontiers in Optics, FiO 2009 - San Jose, CA, United States Duration: Oct 11 2009 → Oct 15 2009

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Frontiers in Optics, FiO 2009
Country/Territory	United States
City	San Jose, CA
Period	10/11/09 → 10/15/09

ASJC Scopus subject areas

Instrumentation
Atomic and Molecular Physics, and Optics

Access to Document

10.1364/fio.2009.fthk3

Cite this

@inproceedings{e6c684abaa09445da0227127ba64636f,

title = "High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications",

abstract = "We present technique of achieving high spatial resolution quantum well intermixing in InP/InGaAsP-based quantum well structures. It utilizes submicron-width deeply-etched trench as diffusion-stopper during the intermixing. Results indicate <0.4 μm spatial control with >100 nm bandgap blueshift.",

author = "Lee, {Chee Wei} and Yicheng Lai and Huang, {Y. Yingyan} and Boyang Liu and Ho, {Seng Tiong}",

year = "2009",

doi = "10.1364/fio.2009.fthk3",

language = "English (US)",

isbn = "9781557528780",

series = "Optics InfoBase Conference Papers",

publisher = "Optical Society of America (OSA)",

booktitle = "Frontiers in Optics, FiO 2009",

}

TY - GEN

T1 - High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications

AU - Lee, Chee Wei

AU - Lai, Yicheng

AU - Huang, Y. Yingyan

AU - Liu, Boyang

AU - Ho, Seng Tiong

PY - 2009

Y1 - 2009

N2 - We present technique of achieving high spatial resolution quantum well intermixing in InP/InGaAsP-based quantum well structures. It utilizes submicron-width deeply-etched trench as diffusion-stopper during the intermixing. Results indicate <0.4 μm spatial control with >100 nm bandgap blueshift.

AB - We present technique of achieving high spatial resolution quantum well intermixing in InP/InGaAsP-based quantum well structures. It utilizes submicron-width deeply-etched trench as diffusion-stopper during the intermixing. Results indicate <0.4 μm spatial control with >100 nm bandgap blueshift.

UR - http://www.scopus.com/inward/record.url?scp=84920730793&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84920730793&partnerID=8YFLogxK

U2 - 10.1364/fio.2009.fthk3

DO - 10.1364/fio.2009.fthk3

M3 - Conference contribution

AN - SCOPUS:84920730793

SN - 9781557528780

T3 - Optics InfoBase Conference Papers

BT - Frontiers in Optics, FiO 2009

PB - Optical Society of America (OSA)

T2 - Frontiers in Optics, FiO 2009

Y2 - 11 October 2009 through 15 October 2009

ER -

High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this