High-spatial-resolution quantum well intermixing technique for all-optical nano-device fabrications

Chee Wei Lee*, Yicheng Lai, Y. Yingyan Huang, Boyang Liu, Seng Tiong Ho

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We present technique of achieving high spatial resolution quantum well intermixing in InP/InGaAsP-based quantum well structures. It utilizes submicron-width deeply-etched trench as diffusion-stopper during the intermixing. Results indicate <0.4 μm spatial control with >100 nm bandgap blueshift.

Original languageEnglish (US)
Title of host publicationFrontiers in Optics, FiO 2009
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528780
DOIs
StatePublished - 2009
EventFrontiers in Optics, FiO 2009 - San Jose, CA, United States
Duration: Oct 11 2009Oct 15 2009

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherFrontiers in Optics, FiO 2009
CountryUnited States
CitySan Jose, CA
Period10/11/0910/15/09

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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