Abstract
We present a high-spatial-resolution subsurface microscopy technique that significantly increases the numerical aperture of a microscope without introducing an additional spherical aberration. Consequently, the diffraction-limited spatial resolution is improved beyond the limit of standard subsurface microscopy. By realizing a numerical aperture of 3.4, we experimentally demonstrate a lateral spatial resolution of better than 0.23 μm in subsurface inspection of Si integrated circuits at near infrared wavelengths.
Original language | English (US) |
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Pages (from-to) | 4071-4073 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 78 |
Issue number | 26 |
DOIs | |
State | Published - Jun 25 2001 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)