High spatial resolution subsurface microscopy using radially polarized beam

Abdulkadir Yurt*, Michael D W Grogan, Yang Lu, Euan Ramsay, M. Selim Unlu, Siddharth Ramachandran, Bennett B. Goldberg

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We experimentally study spot size reduction by using radially polarized beam for subsurface silicon integrated circuit microscopy. Metallic lines fabricated on a silicon substrate with linewidth / spacing ∼ 130nm / 70nm were resolved through the substrate at λ0 = 1310nm.

Original languageEnglish (US)
Title of host publication2012 IEEE Photonics Conference, IPC 2012
PublisherIEEE Computer Society
Pages554-556
Number of pages3
ISBN (Print)9781457707315
DOIs
StatePublished - 2012
Event25th IEEE Photonics Conference, IPC 2012 - Burlingame, CA, United States
Duration: Sep 23 2012Sep 27 2012

Publication series

Name2012 IEEE Photonics Conference, IPC 2012

Other

Other25th IEEE Photonics Conference, IPC 2012
CountryUnited States
CityBurlingame, CA
Period9/23/129/27/12

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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