High-speed nearfield optical recording using plasmonic flying head

Liang Pan, Yong Shik Park, Erick Ulin-Avila, Yi Xiong, Li Zeng, Cheng Sun, David B. Bogy, Xiang Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical lithography has been the critical process for continuous size reduction of semiconductor devices and circuits manufacturing1, 2. As the industry is continually improving the lithography feature size, conventional optical lithography becomes more difficult and costive in satisfying the ever increasing demands in nano-manufacturing because of the fundamental limit of diffraction. Many maskless processes are capable of creating feature sizes better than optical lithography, but they all suffer from their low throughput. Here we experimentally demonstrated the capability of parallel patterning with 50 nm linewidth with a high flying speed at 10 meter/second. This is a low-cost high-throughput nano-fabrication scheme which has the potential of a few orders of magnitude higher throughput than current maskless techniques. It promises a new route towards the next generation nano-manufacturing. Besides its application in nanolithography, this technique can also be used for nanoscale metrology, imaging and data storage.

Original languageEnglish (US)
Title of host publicationJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011
PublisherOptical Society of America (OSA)
ISBN (Print)9781557529152
DOIs
StatePublished - 2011
EventJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011 - Kauai, HI, United States
Duration: Jul 17 2011Jul 20 2011

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011
CountryUnited States
CityKauai, HI
Period7/17/117/20/11

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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