Abstract
In this paper, we present a low-cost and high-throughput nanofabrication method to realize metasurfaces that have selective absorption/emission in the mid-infrared region of the electromagnetic spectrum. We have developed DUV projection lithography to produce arbitrary patterns with sub-80 nm feature sizes. As examples of practical applications, we experimentally demonstrate structures with single and double spectral absorption/emission features, and in close agreement with numerical simulation. The fundamental mechanism of perfect absorption is discussed as well. Selective infrared absorbers/emitters are critical elements in realizing efficient thermophotovoltaic cells and high-performance biosensors.
Original language | English (US) |
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Article number | 035301 |
Journal | Nanotechnology |
Volume | 27 |
Issue number | 3 |
DOIs | |
State | Published - Dec 11 2015 |
Funding
Keywords
- infrared selective absorber/emitter
- metasurfaces
- microsphere photolithography
- nanofabrication
- perfect absorber
- thermo-photovoltaic cells
ASJC Scopus subject areas
- General Chemistry
- Mechanics of Materials
- Mechanical Engineering
- Bioengineering
- Electrical and Electronic Engineering
- General Materials Science