High-throughput realization of an infrared selective absorber/emitter by DUV microsphere projection lithography

Alireza Bonakdar, Mohsen Rezaei, Eric Dexheimer, Hooman Mohseni

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

In this paper, we present a low-cost and high-throughput nanofabrication method to realize metasurfaces that have selective absorption/emission in the mid-infrared region of the electromagnetic spectrum. We have developed DUV projection lithography to produce arbitrary patterns with sub-80 nm feature sizes. As examples of practical applications, we experimentally demonstrate structures with single and double spectral absorption/emission features, and in close agreement with numerical simulation. The fundamental mechanism of perfect absorption is discussed as well. Selective infrared absorbers/emitters are critical elements in realizing efficient thermophotovoltaic cells and high-performance biosensors.

Original languageEnglish (US)
Article number035301
JournalNanotechnology
Volume27
Issue number3
DOIs
StatePublished - Dec 11 2015

Keywords

  • infrared selective absorber/emitter
  • metasurfaces
  • microsphere photolithography
  • nanofabrication
  • perfect absorber
  • thermo-photovoltaic cells

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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