High-yield drying process for surface microstructures using active levitation

Chang Liu; Thomas Tsao; Yu Chong Tai

High-yield drying process for surface microstructures using active levitation

Chang Liu^*, Thomas Tsao, Yu Chong Tai

^*Corresponding author for this work

Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Scopus citations

Abstract

We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm²). Here, magnetic force is used to actively levitate (deflect) released microstructures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed.

Original language	English (US)
Title of host publication	International Conference on Solid-State Sensors and Actuators, Proceedings
Publisher	IEEE
Pages	241-244
Number of pages	4
Volume	1
State	Published - Jan 1 1997
Event	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA Duration: Jun 16 1997 → Jun 19 1997

Other

Other	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
City	Chicago, IL, USA
Period	6/16/97 → 6/19/97

ASJC Scopus subject areas

Engineering(all)

Cite this

@inproceedings{163a8616edc74f4a9d8a35468f0069aa,

title = "High-yield drying process for surface microstructures using active levitation",

abstract = "We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm2). Here, magnetic force is used to actively levitate (deflect) released microstructures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed.",

author = "Chang Liu and Thomas Tsao and Tai, {Yu Chong}",

year = "1997",

month = jan,

day = "1",

language = "English (US)",

volume = "1",

pages = "241--244",

booktitle = "International Conference on Solid-State Sensors and Actuators, Proceedings",

publisher = "IEEE",

note = "Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) ; Conference date: 16-06-1997 Through 19-06-1997",

}

TY - GEN

T1 - High-yield drying process for surface microstructures using active levitation

AU - Liu, Chang

AU - Tsao, Thomas

AU - Tai, Yu Chong

PY - 1997/1/1

Y1 - 1997/1/1

N2 - We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm2). Here, magnetic force is used to actively levitate (deflect) released microstructures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed.

AB - We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm2). Here, magnetic force is used to actively levitate (deflect) released microstructures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed.

UR - http://www.scopus.com/inward/record.url?scp=0030659905&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030659905&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0030659905

VL - 1

SP - 241

EP - 244

BT - International Conference on Solid-State Sensors and Actuators, Proceedings

PB - IEEE

T2 - Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)

Y2 - 16 June 1997 through 19 June 1997

ER -

High-yield drying process for surface microstructures using active levitation

Abstract

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ASJC Scopus subject areas

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