High-yield drying process for surface microstructures using active levitation

Chang Liu*, Thomas Tsao, Yu Chong Tai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm2). Here, magnetic force is used to actively levitate (deflect) released microstructures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed.

Original languageEnglish (US)
Title of host publicationInternational Conference on Solid-State Sensors and Actuators, Proceedings
PublisherIEEE
Pages241-244
Number of pages4
Volume1
StatePublished - Jan 1 1997
EventProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA
Duration: Jun 16 1997Jun 19 1997

Other

OtherProceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
CityChicago, IL, USA
Period6/16/976/19/97

ASJC Scopus subject areas

  • Engineering(all)

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