HIGH YIELD MANUFACTURE OF LOW THRESHOLD, HIGH RELIABILITY, 1. 30 mu m BURIED HETEROSTRUCTURE LASER DIODES BY METAL ORGANIC CHEMICAL VAPOUR DEPOSITION.

M. Krakowski*, R. Blondeau, J. Ricciardi, P. Hirtz, M. Razeghi, B. de Cremoux

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

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Engineering