High Yield Manufacture of Very Low Threshold, High Reliability, 1.30-µm Buried Heterostructure Laser Diodes Grown by Metal Organic Chemical Vapor Deposition

Michel Krakowski, Robert Blondeau, K. Kazmierski, Manijeh Razeghi, J. Ricciardi, P. Hirtz, Baudouin De Cremoux

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

We report the fabrication of very low threshold buried heterostructure lasers by a two-step MOCVD technique. We show very high yield of fabrication, very high uniformity of the initial characteristics, good reproducibility, and low degradation rate during the aging test.

Original languageEnglish (US)
Pages (from-to)1470-1474
Number of pages5
JournalJournal of Lightwave Technology
Volume4
Issue number10
DOIs
StatePublished - Oct 1986

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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