TY - JOUR
T1 - High Yield Manufacture of Very Low Threshold, High Reliability, 1.30-µm Buried Heterostructure Laser Diodes Grown by Metal Organic Chemical Vapor Deposition
AU - Krakowski, Michel
AU - Blondeau, Robert
AU - Kazmierski, K.
AU - Razeghi, Manijeh
AU - Ricciardi, J.
AU - Hirtz, P.
AU - Cremoux, Baudouin De
PY - 1986/10
Y1 - 1986/10
N2 - We report the fabrication of very low threshold buried heterostructure lasers by a two-step MOCVD technique. We show very high yield of fabrication, very high uniformity of the initial characteristics, good reproducibility, and low degradation rate during the aging test.
AB - We report the fabrication of very low threshold buried heterostructure lasers by a two-step MOCVD technique. We show very high yield of fabrication, very high uniformity of the initial characteristics, good reproducibility, and low degradation rate during the aging test.
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U2 - 10.1109/JLT.1986.1074644
DO - 10.1109/JLT.1986.1074644
M3 - Article
AN - SCOPUS:0022791552
SN - 0733-8724
VL - 4
SP - 1470
EP - 1474
JO - Journal of Lightwave Technology
JF - Journal of Lightwave Technology
IS - 10
ER -