Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J. Marks*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Scopus citations
Original languageEnglish (US)
Pages (from-to)65-69
Number of pages5
JournalChemical Vapor Deposition
Issue number2
StatePublished - Mar 1999

ASJC Scopus subject areas

  • General Chemistry
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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