Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot; Anchuan Wang; Richard J. McNeely; Louise Liable-Sands; Arnold L. Rheingold; Tobin J. Marks

doi:10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2

Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J. Marks^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Original language	English (US)
Pages (from-to)	65-69
Number of pages	5
Journal	Chemical Vapor Deposition
Volume	5
Issue number	2
DOIs	https://doi.org/10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2
State	Published - Mar 1999

ASJC Scopus subject areas

Chemistry(all)
Surfaces and Interfaces
Process Chemistry and Technology

Access to Document

10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2

Cite this

@article{f4d174fc902c45d1a0eeeaaa4e23cc9a,

title = "Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films",

author = "Belot, {John A.} and Anchuan Wang and McNeely, {Richard J.} and Louise Liable-Sands and Rheingold, {Arnold L.} and Marks, {Tobin J.}",

year = "1999",

month = mar,

doi = "10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2",

language = "English (US)",

volume = "5",

pages = "65--69",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "2",

}

TY - JOUR

T1 - Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

AU - Belot, John A.

AU - Wang, Anchuan

AU - McNeely, Richard J.

AU - Liable-Sands, Louise

AU - Rheingold, Arnold L.

AU - Marks, Tobin J.

PY - 1999/3

Y1 - 1999/3

UR - http://www.scopus.com/inward/record.url?scp=0039772494&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0039772494&partnerID=8YFLogxK

U2 - 10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2

DO - 10.1002/(sici)1521-3862(199903)5:2<65::aid-cvde65>3.3.co;2-2

M3 - Article

AN - SCOPUS:0039772494

SN - 0948-1907

VL - 5

SP - 65

EP - 69

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 2

ER -

Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

ASJC Scopus subject areas

Access to Document

Other files and links

CCDC 114935: Experimental Crystal Structure Determination

Cite this

Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

ASJC Scopus subject areas

Access to Document

Other files and links

Datasets

CCDC 114935: Experimental Crystal Structure Determination

Cite this