Imaging the irradiance distribution in the optical near field

J. Aizenberg*, J. A. Rogers, K. E. Paul, G. M. Whitesides

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

70 Scopus citations

Abstract

This letter describes the use of a sensitive photoresist for direct imaging of optical intensity profiles in near-field photolithographic experiments. A comparison between experimental patterns in exposed, developed photoresist and calculated profiles of intensity shows that this procedure provides a reliable semiquantitative image of the irradiance distribution in the near field; experiment and theory correlate adequately. A potential use of the superficial diffraction contrast recorded in photoresist as the basis for a new method of the fabrication of nanostructures is discussed.

Original languageEnglish (US)
Pages (from-to)3773-3775
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number26
DOIs
StatePublished - Dec 29 1997

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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