Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography

INIS

• alcohols 16%
• atomic force microscopy 33%
• concentration 33%
• doped materials 16%
• etching 100%
• fabrication 33%
• humidity 33%
• mixtures 16%
• nanostructures 33%
• oxidation 33%
• oxides 16%
• potassium hydroxides 66%
• removal 33%
• silicon 66%
• surfaces 16%
• variations 16%
• voltage 16%

Material Science

• Admixture 16%
• Atomic Force Microscopy 16%
• Etching 83%
• Material 16%
• Mixture 16%
• Nanocrystalline Material 33%
• Nanolithography 33%
• Oxidation Reaction 33%
• Oxide 16%
• Potassium 33%
• Silicon 50%
• Silicon on Insulator 16%
• Surface 16%
• Temperature 33%
• Wet Etching 16%