Improved surface chemistries, thin film deposition techniques, and stamp designs for nanotransfer printing

Etienne Menard; Lise Bilhaut; Jana Zaumseil; John A. Rogers

doi:10.1021/la048827k

Improved surface chemistries, thin film deposition techniques, and stamp designs for nanotransfer printing

Etienne Menard, Lise Bilhaut, Jana Zaumseil, John A. Rogers^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

111 Scopus citations

Abstract

Nanotransfer printing represents an additive approach for patterning thin layers of solid materials with nanometer resolution. The surface chemistries, thin film deposition techniques, and stamp designs are all important for the proper operation of this method. This paper presents some details concerning processing procedures and other considerations needed for patterning two- and three-dimensional nanostructures with low density of defects and minimal distortions.

Original language	English (US)
Pages (from-to)	6871-6878
Number of pages	8
Journal	Langmuir
Volume	20
Issue number	16
DOIs	https://doi.org/10.1021/la048827k
State	Published - Aug 3 2004

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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10.1021/la048827k

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abstract = "Nanotransfer printing represents an additive approach for patterning thin layers of solid materials with nanometer resolution. The surface chemistries, thin film deposition techniques, and stamp designs are all important for the proper operation of this method. This paper presents some details concerning processing procedures and other considerations needed for patterning two- and three-dimensional nanostructures with low density of defects and minimal distortions.",

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Improved surface chemistries, thin film deposition techniques, and stamp designs for nanotransfer printing

Abstract

ASJC Scopus subject areas

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