Improving thin-film manufacturing yield with robust optimization

Jonathan R. Birge; Franz X. Kärtner; Omid Nohadani

doi:10.1364/AO.50.000C36

Improving thin-film manufacturing yield with robust optimization

Jonathan R. Birge, Franz X. Kärtner, Omid Nohadani

Industrial Engineering and Management Sciences

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.

Original language	English (US)
Pages (from-to)	C36-C40
Journal	Applied optics
Volume	50
Issue number	9
DOIs	https://doi.org/10.1364/AO.50.000C36
State	Published - Mar 20 2011

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

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10.1364/AO.50.000C36

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Improving thin-film manufacturing yield with robust optimization

Abstract

ASJC Scopus subject areas

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