Improving thin-film manufacturing yield with robust optimization

Jonathan R. Birge, Franz X. Kärtner, Omid Nohadani

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.

Original languageEnglish (US)
Pages (from-to)C36-C40
JournalApplied optics
Volume50
Issue number9
DOIs
StatePublished - Mar 20 2011

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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