In situ block copolymer formation during solid-state shear pulverization: An explanation for blend compatibilization via interpolymer radical reactions

Andrew H. Lebovitzand*, John M Torkelson

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract

Interpolymer radical coupling leading to block copolymer formation is demonstrated for the first time in the solid state and in the absence of diffusion using solid-state shear pulverization. Fluorescence-detection gel permeation chromatography detected interpolymer reaction in high-molecular weight polystyrene (PS)/pyrene-labeled PS and high-MW poly(methyl methacrylate) (PMMA)/pyrene-labeled PS blends. Proof of interpolymer radical coupling supports prior pulverization studies demonstrating compatibilization, i.e., stability of dispersed-phase to long-time annealing, of PS/high density polyethylene and PS/PMMA blends.

Original languageEnglish (US)
Pages2323-2327
Number of pages5
StatePublished - Oct 14 2003
Event61st Annual Technical Conference ANTEC 2003 - Nashville, TN, United States
Duration: May 4 2003May 8 2003

Other

Other61st Annual Technical Conference ANTEC 2003
Country/TerritoryUnited States
CityNashville, TN
Period5/4/035/8/03

Keywords

  • Compatibilization
  • Coupling
  • Fluorescence
  • Pulverization

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Polymers and Plastics

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