In Situ Growth of Epitaxial YAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition

Bin Han; Deborah A. Neumayer; Douglas L. Schulz; Bruce J. Hinds; Tobin J. Marks; Hong Zhang; Vinayak P. Dravid

doi:10.1021/cm00025a006

In Situ Growth of Epitaxial YAlO₃ Thin Films by Metal-Organic Chemical Vapor Deposition

Bin Han, Deborah A. Neumayer, Douglas L. Schulz, Bruce J. Hinds, Tobin J. Marks^*, Hong Zhang, Vinayak P. Dravid

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Original language	English (US)
Pages (from-to)	14-16
Number of pages	3
Journal	Chemistry of Materials
Volume	5
Issue number	1
DOIs	https://doi.org/10.1021/cm00025a006
State	Published - 1993

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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10.1021/cm00025a006

Cite this

@article{42947b3a338946e19478568559c3062d,

title = "In Situ Growth of Epitaxial YAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition",

author = "Bin Han and Neumayer, {Deborah A.} and Schulz, {Douglas L.} and Hinds, {Bruce J.} and Marks, {Tobin J.} and Hong Zhang and Dravid, {Vinayak P.}",

year = "1993",

doi = "10.1021/cm00025a006",

language = "English (US)",

volume = "5",

pages = "14--16",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "1",

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T1 - In Situ Growth of Epitaxial YAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition

AU - Han, Bin

AU - Neumayer, Deborah A.

AU - Schulz, Douglas L.

AU - Hinds, Bruce J.

AU - Marks, Tobin J.

AU - Zhang, Hong

AU - Dravid, Vinayak P.

PY - 1993

Y1 - 1993

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U2 - 10.1021/cm00025a006

DO - 10.1021/cm00025a006

M3 - Article

AN - SCOPUS:0041136030

SN - 0897-4756

VL - 5

SP - 14

EP - 16

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 1

ER -

In Situ Growth of Epitaxial YAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition

ASJC Scopus subject areas

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In Situ Growth of Epitaxial YAlO₃ Thin Films by Metal-Organic Chemical Vapor Deposition