In situ investigation of InAs metalorganic chemical vapor deposition growth using reflectance anisotropy

Stephanie M. Koch*, Olivier Acher, Franck Omnes, Martin Defour, Manijeh Razeghi, B. Drévillon

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Using reflectance anisotropy, we have investigated InAs metalorganic chemical vapor deposition under optimal growth conditions. The measured optical anisotropy of the growing surface is significantly different from that of the nongrowing, AsH3-stabilized surface. This difference δ becomes more pronounced at low V/III gas flow ratios and low temperatures. The value of δ also depends on the light energy, reaching a maximum in the range of 2.30-2.38 eV. In addition, we show that it is possible to monitor effects of the reactor on the growth, namely transient flow perturbations on the growing surface due to the switching of gas flows.

Original languageEnglish (US)
Pages (from-to)3364-3369
Number of pages6
JournalJournal of Applied Physics
Volume68
Issue number7
DOIs
StatePublished - Dec 1 1990

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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