Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Gallium Arsenide
100%
InGaP
100%
Diode Laser
100%
InGaAsP
100%
Separate Confinement
100%
Diode
50%
Full Width at Half Maximum
50%
Emission Spectrum
50%
Pumping System
50%
Threshold Current Density
50%
Differential Efficiency
50%
Series Resistance
50%
Pattern Spectrum
50%
Separate Confinement Heterostructure
50%
Aluminum-free
50%
Nd-YAG
50%
Laser Machining
50%
Near-field Pattern
50%
Near-field Emission
50%
Engineering
Gallium Arsenide
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Heterostructures
50%
Series Resistance
50%
Threshold Current Density
50%
Field Pattern
50%
Pumping System
50%
Field Emission
50%
Emission Spectra
50%
Material Science
Gallium Arsenide
100%
Chemical Vapor Deposition
100%
Laser Diode
100%
Heterojunction
50%
Density
50%
Aluminum
50%
Semiconductor Laser
50%
Physics
Semiconductor Laser
100%
Emission Spectra
100%
Metalorganic Chemical Vapor Deposition
100%
Semiconductor Laser
100%