Initial results on the Ag|CdO {222} interface

Atomic scale interfacial chemistry and sequencing of ordered cadmium/oxygen planes

David K. Chan*, Ho Jang, David N Seidman, Karl L. Merkle

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Citations (Scopus)
Original languageEnglish (US)
Pages (from-to)1119-1124
Number of pages6
JournalScripta Metallurgica et Materiala
Volume29
Issue number8
DOIs
StatePublished - Oct 15 1993

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Surface chemistry
Cadmium
Oxygen

ASJC Scopus subject areas

  • Engineering(all)

Cite this

@article{982ad7a235d84951919605fc6a3ed39e,
title = "Initial results on the Ag|CdO {222} interface: Atomic scale interfacial chemistry and sequencing of ordered cadmium/oxygen planes",
author = "Chan, {David K.} and Ho Jang and Seidman, {David N} and Merkle, {Karl L.}",
year = "1993",
month = "10",
day = "15",
doi = "10.1016/0956-716X(93)90188-X",
language = "English (US)",
volume = "29",
pages = "1119--1124",
journal = "Scripta Materialia",
issn = "1359-6462",
publisher = "Elsevier Limited",
number = "8",

}

Initial results on the Ag|CdO {222} interface : Atomic scale interfacial chemistry and sequencing of ordered cadmium/oxygen planes. / Chan, David K.; Jang, Ho; Seidman, David N; Merkle, Karl L.

In: Scripta Metallurgica et Materiala, Vol. 29, No. 8, 15.10.1993, p. 1119-1124.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Initial results on the Ag|CdO {222} interface

T2 - Atomic scale interfacial chemistry and sequencing of ordered cadmium/oxygen planes

AU - Chan, David K.

AU - Jang, Ho

AU - Seidman, David N

AU - Merkle, Karl L.

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EP - 1124

JO - Scripta Materialia

JF - Scripta Materialia

SN - 1359-6462

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