Initial results on the Ag|CdO {222} interface: Atomic scale interfacial chemistry and sequencing of ordered cadmium/oxygen planes

David K. Chan*, Ho Jang, David N. Seidman, Karl L. Merkle

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations
Original languageEnglish (US)
Pages (from-to)1119-1124
Number of pages6
JournalScripta Metallurgica et Materiala
Issue number8
StatePublished - Oct 15 1993

ASJC Scopus subject areas

  • Engineering(all)

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