Abstract
Position-sensitive atom probe microanalysis has been used to study diffusion in Co-Pd bilayers and multilayer films. Diffusion coefficients have been determined and the effect of grain boundaries on diffusion rates have been assessed.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 83-84 |
| Number of pages | 2 |
| Journal | Journal of Magnetism and Magnetic Materials |
| Volume | 156 |
| Issue number | 1-3 |
| DOIs | |
| State | Published - 1996 |
| Event | Proceedings of the 1995 2nd International Symposium on Metallic Multilayers, MML - Cambridge, UK Duration: Sep 11 1995 → Sep 14 1995 |
Funding
Our results show the importanceo f the presenceo f grain boundarieisn polycrystallinCeo /Pd films, as these appeart o act as preferentiasli tesf or intermixingr,e ducing the thermal stability of the films. Thin (~ 5 bilayers) Co-Pd films manufacturebdy vapourd epositionin UHV conditionsa nd analysedin situ have shown good perpen-dicularm agnetica nisotropya nd a structurec ommensurate with this property.W e have also demonstratetdh at the PoSAP is an effectivem eanso f measurindgi ffusionc oef-ficientsa t temperaturebse lowt hoser eachablbey classical methods. AcknowledgemenWt:e are gratefult o the Royal Society (AC and AKPL) and to the EPSRC for financial support.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics