Interfacial X-ray photospectrometry study of In_0.53Ga _0.47As under different passivation treatments for metal oxide semiconductor field effect transistor devices

In this reported work, comparison is made of a passivation treatment of a 3-4 compound semiconductor using ammonia and ammonium sulphide solution. The treatment is applied on In_0.53Ga0.47As which is chosen for its high mobility especially in high electron mobility transistors. The samples were treated with various parameters such as precursor, vacuum condition and different chemical solutions. Then, samples were deposited with the high k-dielectric Al_2O3 (4 nm thickness) using the atomic layer deposition technique. Five different passivation treatments were used to give proper comparison. Native oxide elements and contaminants were inspected at the interface of the oxide layer and the substrate using X-ray photospectrometry in different angles (25° and 70°). The results indicate the effectiveness of some treatments to eliminate the oxide of gallium and arsenic with a slight presence of indium oxide.