Investigation of heteroepitaxial growth of magnetite thin films

G. E. Sterbinsky, J. Cheng, P. T. Chiu, B. W. Wessels*, D. J. Keavney

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

Epitaxial magnetite (Fe3 O4) thin films were deposited by molecular beam epitaxy using molecular oxygen as the oxidant. Films deposited on (001) SrTi O3, (001) MgO, and (001) BaTi O3 surfaces are epitaxial with the film (001) parallel to the substrate (001) and the film 〈100〉 parallel to the substrate 〈100〉. X-ray magnetic circular dichroism was used to determine the relative Fe2+ Fe3+ stoichiometry of the magnetite films, which was nearly independent of oxygen partial pressure over the range studied. All films show no in-plane magnetic anisotropy. Coercive fields ranged from 0.019 to 0.039 T and depended on film roughness.

Original languageEnglish (US)
Pages (from-to)1389-1392
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number4
DOIs
StatePublished - 2007

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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