Investigation of the factors influencing nanostructure array growth by PLD towards reproducible wafer-scale growth

Vinod E. Sandana*, David J. Rogers, Féréchteh Hosseini Teherani, Philippe Bove, Manijeh Razeghi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The growth of catalyst-free ZnO nanostructure arrays on silicon (111) substrates by pulsed laser deposition was investigated. Without an underlayer, randomly oriented, micron-scale structures were obtained. Introduction of a c-axis oriented ZnO underlayer resulted in denser arrays of vertically oriented nanostructures with either tapering, vertical-walled or broadening forms, depending on background Ar pressure. Nanostructure pitch seemed to be determined by underlayer grain size while nanostructure widths could be narrowed from ∼100-500 to ∼10-50 nm by a 50°C increase in growth temperature. A dimpled underlayer topography correlated with the moth-eye type arrays while a more granular surface was linked to vertically walled nanocolumns. Between-wafer reproducibility was demonstrated for both moth-eye and vertical nanocolumn arrays. Broadening nanostructures proved difficult to replicate, however. Full 2 inch wafer coverage was obtained by rastering the target with the laser beam.

Original languageEnglish (US)
Pages (from-to)449-454
Number of pages6
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume211
Issue number2
DOIs
StatePublished - Feb 2014

Keywords

  • ZnO
  • catalyst-free
  • nanostructure
  • wide area

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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